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Slurry Effect of Azole-Free Inhibitors on Cu Dissolution in H2O2 and Non-H2O2 Based Wet Etching Solutions During Hard Mask Removal
- 제목
- Slurry Effect of Azole-Free Inhibitors on Cu Dissolution in H2O2 and Non-H2O2 Based Wet Etching Solutions During Hard Mask Removal
- 저자
- 김태곤
- 발행일
- 2025-09-11
- 학회명
- 17th Symposium on Ultra Clean Processing of Semiconductor Surfaces
- 개최지
- Leuven