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Stable Ferroelectric Properties of Sub-5 nm Hafnium-Zirconium-Oxide Thin Films Deposited via Atomic Layer Deposition
- 제목
- Stable Ferroelectric Properties of Sub-5 nm Hafnium-Zirconium-Oxide Thin Films Deposited via Atomic Layer Deposition
- 저자
- 안지훈
- 발행일
- 2024-11-12
- 학회명
- Korean International Semiconductor Conference on Manufacturing Technology 2024