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Development of Post InGaAs CMP Cleaning Process for sub 10nm Device Application
- 제목
- Development of Post InGaAs CMP Cleaning Process for sub 10nm Device Application
- 저자
- 박진구
- 발행일
- 2017-10-13
- 학회명
- 2017 International Conference on Planarization/CMP Technology
- 개최지
- 벨기에, Leuven