Quantitative Analysis of Surface Potential Fluctuation at MOS Interfaces Using Conductance Method

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초록

The surface potential fluctuation ( sigma(s) ), determined by broadening of conductance curves in the conductance method, is an interesting quantity because sigma(s) can be interpreted to be related to the total amount of MOS interface charges. Although the conductance method is widely used to evaluate interface state density, the quantitative relationship between sigma(s) and MOS interface charges has not been fully investigated yet. In this research, the relationship between sigma(s) and interface charges is quantitatively examined by utilizing interface charge generation by Fowler-Nordheim (FN) injection and is compared with a theoretical model. As a result, it has been experimentally verified that sigma s can be universally expressed as a function of an areal density of total interfacial charges with a specific power law relationship, which is 0.5. This result is well explained by the theoretical model.

키워드

StressMOS capacitorsLogic gatesFluctuationsElectric potentialMathematical modelsCapacitanceSubstratesStress measurementInterface statesBrews' modelcapacitance-voltage methodconductance methodMOS interface chargesurface potential fluctuation (sigma s)Terman methodINVERSION-LAYERCHARGETRAPDENSITYSTACKMODEL
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Quantitative Analysis of Surface Potential Fluctuation at MOS Interfaces Using Conductance Method
저자
Shin, SanghoonTaoka, NoriyukiTakenaka, MitsuruTakagi, Shinichi
DOI
10.1109/TED.2025.3649624
발행일
2026-03
유형
Article
저널명
IEEE Transactions on Electron Devices
73
3
페이지
1136 ~ 1141