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Post CMP Surface Preparation in sub 10nm device (Invited)
- 제목
- Post CMP Surface Preparation in sub 10nm device (Invited)
- 저자
- 박진구
- 발행일
- 2016-10-17
- 학회명
- 2016 International Conference on Planarization/CMP Technology
- 개최지
- Beijing Friendship Hotel, Beijing, China