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Frank–van der Merwe Growth versus Volmer–Weber Growth in Successive Stacking of a Few-Layer Bi2Te3/Sb2Te3 by van der Waals Heteroepitaxy: The Critical Roles of Finite Lattice-Mismatch with Seed Substrates
- Heo, Hoseok;
- Sung, Ji Ho;
- Ahn, Ji-Hoon;
- Ghahari, Fereshte;
- Taniguchi, Takashi;
- 외 3명
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35초록
Different growth mechanisms of van der Waals heteroepitaxial 2D Bi2Te3/Sb2Te3 stacking by choosing different substrates are reported. Sequential Bi2Te3/Sb2Te3 stacking growth mode becomes layer-by-layer growth on h-BN substrates, and 3D island growth on SiO2/Si. Compressive strain in the h-BN substrates imposed by the lattice mismatch plays a crucial role to determine different growth modes in these 2D nucleation kinetics models.
키워드
2D materials; metal chalcogenide; superlattice; thin film growth modes; van der Waals epitaxy; VAPOR-DEPOSITION GROWTH; EPITAXIAL-GROWTH; VERTICAL HETEROSTRUCTURES; SURFACE-STATES; MONOLAYER MOS2; THIN-FILMS; DIFFUSION; GRAPHENE; KINETICSSTRAIN
- 제목
- Frank–van der Merwe Growth versus Volmer–Weber Growth in Successive Stacking of a Few-Layer Bi2Te3/Sb2Te3 by van der Waals Heteroepitaxy: The Critical Roles of Finite Lattice-Mismatch with Seed Substrates
- 저자
- Heo, Hoseok; Sung, Ji Ho; Ahn, Ji-Hoon; Ghahari, Fereshte; Taniguchi, Takashi; Watanabe, Kenji; Kim, Philip; Jo, Moon Ho
- 발행일
- 2017-01
- 유형
- Article
- 권
- 3
- 호
- 2
- 페이지
- 1 ~ 7
- 언어
- ENG
- 출판사
- Wiley-VCH Verlag
- 발행국가
- 미국
- 분량
- 7 페이지
- ISSN
- E 2199-160X
P 2199-160X