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초록
The main technique of NIL is relatively simple when compared with the conventional photolithography method. To nanoimprint a surface, three components are required: molds with suitable feature size, materials to be printed, and equipment for printing with adequate control of temperature, pressure, etc. NIL has the advantage over conventional nanofabrication methods because it is simple, low-cost, and applicable to plastic substrates. © 2007 by Taylor & Francis Group, LLC.
키워드
Anti-stiction layers; Conventional photolithography; Feature sizes; Nano imprinting; Nano-fabrication methods; Nano-imprint; Plastic substrates; Three component
- 제목
- Antistiction layers for nano imprinting lithography
- 저자
- Cha, Nam Goo; Park, Jin-Goo
- 발행일
- 2017-01
- 유형
- Book Chapter
- 저널명
- Nanomanufacturing Handbook
- 페이지
- 183 ~ 215
- 언어
- ENG
- 출판사
- CRC Press
- 발행국가
- 미국
- 분량
- 33 페이지