Antistiction layers for nano imprinting lithography

Citations

SCOPUS

3

초록

The main technique of NIL is relatively simple when compared with the conventional photolithography method. To nanoimprint a surface, three components are required: molds with suitable feature size, materials to be printed, and equipment for printing with adequate control of temperature, pressure, etc. NIL has the advantage over conventional nanofabrication methods because it is simple, low-cost, and applicable to plastic substrates. © 2007 by Taylor & Francis Group, LLC.

키워드

Anti-stiction layers; Conventional photolithography; Feature sizes; Nano imprinting; Nano-fabrication methods; Nano-imprint; Plastic substrates; Three component
제목
Antistiction layers for nano imprinting lithography
저자
Cha, Nam Goo; Park, Jin-Goo
DOI
10.1201/9781420004922-9
발행일
2017-01
유형
Book Chapter
저널명
Nanomanufacturing Handbook
페이지
183 ~ 215