E-beam Lithography를 이용한 3차원 Air-bridge 구조의 제작기법

초록

In this study the three-dimensional air-bridge structures are fabricated using Electron Beam Lithography. A bridge structure is formed by projecting electrons to PMMA multi-layers with varying dose values. Each PMMA layer is differently reacted to incident electrons. The air-bridge structures are fabricated with patterning and evaporating gold (Au) and chrome (Cr). Our fabrication method can be applied to various complex nano-scale structures. Likewise we are known that our process is faster than the previous method and is more reliable for fabricating air-bridge structures.