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Quantitative comparison of silica and ceria abrasive contamination on PVA brush and its effect on post CMP cleaning process
- 제목
- Quantitative comparison of silica and ceria abrasive contamination on PVA brush and its effect on post CMP cleaning process
- 저자
- 박진구
- 발행일
- 2019-09-17
- 학회명
- 2019 International Conference on Planarization/CMP Technology
- 개최지
- Ambassador Hotel, Hsinchu, Taiwan