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Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure
- Kim, Tae-Gon;
- Kim, Donggyu;
- Kim G.;
- Park, Jingoo
Citations
SCOPUS
0초록
The wetting behavior of solutions was successfully visualized in the high aspect ratio multi-stack trench pattern using the inclined-AFM methodology. The visualization allows the characterization of the wetting behavior of cleaning solutions on various hydrophobic surfaces. The experimental results agreed with the values calculated by the Wenzel & Cassie-Baxter model. The wetting characteristic analysis using inclined-AFM is an efficient method regardless of pattern dimensions. © 2022 ECS - The Electrochemical Society.
- 제목
- Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure
- 저자
- Kim, Tae-Gon; Kim, Donggyu; Kim G.; Park, Jingoo
- 발행일
- 2022-06
- 유형
- Conference paper
- 저널명
- ECS Transactions
- 권
- 108
- 호
- 4
- 페이지
- 131 ~ 136
- 언어
- ENG
- 출판사
- Electrochemical Society, Inc.
- 발행국가
- 미국
- 분량
- 6 페이지
- ISSN
- E 1938-6737
P 1938-5862