Reliability of coplanar oxide TFTs: Analysis and improvement

  • Baeck, Ju heyuck
  • Oh, Saeroonter
  • Lee, Dohyung
  • Park, Taeuk park
  • Bae, Jong uk
  • 외 3명
Citations

SCOPUS

11

초록

We confirm that, the PBTS instability, of coplanar, InGaZnO TFTs can be improved, through the minimization of Non-Bridging Oxygen Vole Centers (NBOHC) and, optimization of hydrogen passivation in the GI/ACT interface region. The quantitative analysis of hydrogen and, oxygen in each region are obtained from physical property measurements. Trap density in GI/ACT interface layer is obtained by photonic capacitance-voltage measurements which are correlated, with PBTS characteristics. A decrease of under, coordinated bonding states lessens electron trap density, which brings improvement, in PBTS from Vth = 2.61V to 0.21V by process optimization. © (2017) by SID-the Society for Information Display. All rights reserved.

키워드

A-IGZOCoplanarERDAInterface trap density (Dit)Oxide TFTPBTSPhto C-V methodRBSTop-gateXRRCapacitanceGallium compoundsHydrogenOptimizationOxygenPassivationReliability analysisRubidiumSemiconducting indium compoundsZinc compoundsA-IGZOC-V methodCoplanarERDAInterface trap densityOxide tftPBTSTop gateThin film transistors
제목
Reliability of coplanar oxide TFTs: Analysis and improvement
저자
Baeck, Ju heyuckOh, SaeroonterLee, DohyungPark, Taeuk parkBae, Jong ukPark, Kwon shikYoon, SooyongKang, Inbyeong
DOI
10.1002/sdtp.11611
발행일
2017-05
유형
Conference Paper
저널명
Digest of Technical Papers - SID International Symposium
48
1
페이지
294 ~ 296