전자빔 리소그래피에서의 레지스트 내부 에너지 분포에 대한 전산모사 프로그램의 제작

초록

As one of key technological lithography tools, electron beam lithography requires considerably complicated multiple electron scattering process to predict the final pattern formation and the corresponding processing condition. In this paper, we developed a simulation software to show the energy distribution inside resist materials by employing Monte Carlo method. The simulation information renders us to predict the pattern shapes and its modification as a function of electron acceleration voltage, beam dose and resist material composition.

키워드