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Area-selective atomic layer deposition using inkjet-printed fluorocarbon patterns as mask layers
- Cho, Youngin;
- Yu, Jun ho;
- Yoon, Dai geon;
- Park, Jin-Goo;
- Choi, Kyung hyun;
- 외 1명
Citations
SCOPUS
1초록
This study introduces area‐selective atomic layer deposition (AS‐ALD) using fluorocarbon (FC) mask patterns with low surface energy. FC mask patterns were formed on a glass substrate by inkjet printing method. The surface energy of the printed FC thin film was 13.04 dyne/cm enough low to inhibit nucleation and growth during ALD. 10 µm wide Al2O3 patterns were selectively formed by removal of FC mask patterns using oxygen plasma after Al2O3 ALD processes. © 2018, Blackwell Publishing Ltd. All rights reserved.
키워드
Area-selective Atomic Layer Deposition (AS-ALD); Fluorocarbon; Inkjet Printing; Mask Pattern; Alumina; Aluminum oxide; Atoms; Fluorocarbons; Ink jet printing; Interfacial energy; Masks; Substrates; Area selective; Glass substrates; Ink-jet printing method; Low surface energy; Mask layer; Mask patterns; Nucleation and growth; Oxygen plasmas; Atomic layer deposition
- 제목
- Area-selective atomic layer deposition using inkjet-printed fluorocarbon patterns as mask layers
- 저자
- Cho, Youngin; Yu, Jun ho; Yoon, Dai geon; Park, Jin-Goo; Choi, Kyung hyun; Lee, Sang ho
- 발행일
- 2018-05
- 유형
- Conference Paper
- 권
- 49
- 호
- 1
- 페이지
- 1478 ~ 1481