Shot Noise Suppression in SiGe Resonant Interband Tunneling Diodes

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WEB OF SCIENCE

3
Citations

SCOPUS

3

초록

We report experimental noise studies of SiGe resonant interband tunneling diodes (RITDs) to probe the tunneling transport properties. The shot noise measurements show the signatures of coherent transport not only in the positive differential resistance (PDR) region but also in the plateau-like region on the negative differential resistance (NDR) side of the current-voltage (1-V) trace. The experimentally extracted Fano factor F < 0.5 may suggest that the coherent transport gradually becomes obvious in the NDR region. The variation of the Fano factor through the resonance process is discussed according to the recent theoretical model of coherent tunneling. [DOI: 10.1143/JJAP.47.8752]

키워드

SiGe; RITD; shot noise; coherent transport; Negative resistance; Semiconducting germanium compounds; Shot noise; Silicon alloys; Transport properties; Tunnel diodes; Tunneling (excavation)
제목
Shot Noise Suppression in SiGe Resonant Interband Tunneling Diodes
저자
Kim, Youngsang; Song, Hyunwook; Leei, Takhee; Jeong, Heejun
DOI
10.1143/JJAP.47.8752
발행일
2008-12
유형
Article
저널명
Japanese Journal of Applied Physics
권
47
호
12
페이지
8752 ~ 8755