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Photoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanode
- Park, Min-Joon;
- Jung, Jin-Young;
- Shin, Sun-Mi;
- Song, Jae-Won;
- Nam, Yoon-Ho;
- ... Lee, Jung-Ho;
- 외 1명
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44초록
We employ a thin Al2O3 interlayer between p-NiOX catalyst/n-Si photoanode interfaces to realize an effective oxygen evolution reaction (OER). The Al2O3 interlayer is used to reduce the interface defect density, enhance the band bending by suppressing the Fermi-level pinning effect, and enhance photovoltage at the catalyst/ semiconductor rectifying junction. Our NiOX/Al2O3/n-Si photoanodes generated a photocurrent of 3.36 mA/cm(2) at the equilibrium potential of OER (E-OER = 1.23 V vs. reversible hydrogen electrode in 1 M NaOH solution) and a solar-to-oxygen conversion efficiency of 0.321%. Moreover, the photoanode showed no sign of decay over 20 h of photoelectrochemical water oxidation. (C) 2015 Elsevier B.V. All rights reserved.
키워드
- 제목
- Photoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanode
- 저자
- Park, Min-Joon; Jung, Jin-Young; Shin, Sun-Mi; Song, Jae-Won; Nam, Yoon-Ho; Kim, Dong-Hyung; Lee, Jung-Ho
- 발행일
- 2016-01
- 유형
- Article
- 저널명
- Thin Solid Films
- 권
- 599
- 페이지
- 54 ~ 58
- 언어
- ENG
- 출판사
- ELSEVIER SCIENCE SA
- 발행국가
- 스위스
- 분량
- 5 페이지
- ISSN
- P 0040-6090