Photoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanode

  • Park, Min-Joon; 
  • Jung, Jin-Young; 
  • Shin, Sun-Mi; 
  • Song, Jae-Won; 
  • Nam, Yoon-Ho; 
  • ... Lee, Jung-Ho; 
  • 외 1명
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초록

We employ a thin Al2O3 interlayer between p-NiOX catalyst/n-Si photoanode interfaces to realize an effective oxygen evolution reaction (OER). The Al2O3 interlayer is used to reduce the interface defect density, enhance the band bending by suppressing the Fermi-level pinning effect, and enhance photovoltage at the catalyst/ semiconductor rectifying junction. Our NiOX/Al2O3/n-Si photoanodes generated a photocurrent of 3.36 mA/cm(2) at the equilibrium potential of OER (E-OER = 1.23 V vs. reversible hydrogen electrode in 1 M NaOH solution) and a solar-to-oxygen conversion efficiency of 0.321%. Moreover, the photoanode showed no sign of decay over 20 h of photoelectrochemical water oxidation. (C) 2015 Elsevier B.V. All rights reserved.

키워드

Silicon; Photoanode; Aluminum trioxide; Interlayer; Nickel oxide; Catalyst; Oxygen evolution reaction; Photoelectrochemical cell; ATOMIC LAYER DEPOSITION; WATER OXIDATION; SILICON PHOTOANODES; NICKEL-OXIDE; BEHAVIOR; FILMS; PERFORMANCE; HEMATITE; CELLS
제목
Photoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanode
저자
Park, Min-Joon; Jung, Jin-Young; Shin, Sun-Mi; Song, Jae-Won; Nam, Yoon-Ho; Kim, Dong-Hyung; Lee, Jung-Ho
DOI
10.1016/j.tsf.2015.12.062
발행일
2016-01
유형
Article
저널명
Thin Solid Films
권
599
페이지
54 ~ 58