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Optimization of process conditions of ZrO2 thin films deposited by atomic layer deposition using a new precursor
- 제목
- Optimization of process conditions of ZrO2 thin films deposited by atomic layer deposition using a new precursor
- 저자
- 안지훈
- 발행일
- 2024-01-25
- 학회명
- The 31th Korean Conference in Semiconductors