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Optimum design of a 740 mm-long lens mount for fast line-beam proximity exposure process producing fine patterns with 5 um width
- 제목
- Optimum design of a 740 mm-long lens mount for fast line-beam proximity exposure process producing fine patterns with 5 um width
- 저자
- 오제훈
- 발행일
- 2019-09-24
- 학회명
- 45th International Conference on Micro and Nano Engineering (MNE 2019)
- 개최지
- Rhodes, Greece