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Influence of C4F8 plasma treatment on size control of inkjet-printed dots on a flexible substrate
- Kang, Byung Ju;
- Oh, Je Hoon
WEB OF SCIENCE
12SCOPUS
12초록
The paper aims to investigate the influence of C4F8 plasma treatment on the inkjet-printed dot sizes on flexible PI substrates using the response surface method. The whole experimental region of two independent variables was divided into a number of sub-domains to estimate the accurate relationship between the independent variables and the response. From the RSM analysis, desired dot diameters ranging from 30 mu m to 70 mu m could be obtained by selecting the proper combination of the RF power and gas pressure. The chemical and physical changes in plasma-treated surfaces were also characterized by contact angle measurements, scanning electron microscopy, atomic force microscopy and X-ray photoelectron spectroscopy. The results show that both RF power and gas pressure have a significant influence on the dot diameter. In some experimental region, well-defined dots cannot be produced due to unstable plasmas. The dot diameters on the plasma-treated surfaces are well correlated with the contact angles on them. The roughness and F/C ratio of surfaces are also affected by the plasma treatment. The plasma condition yielding higher F content results in more hydrophobic surfaces. (C) 2010 Elsevier B.V. All rights reserved.
키워드
- 제목
- Influence of C4F8 plasma treatment on size control of inkjet-printed dots on a flexible substrate
- 저자
- Kang, Byung Ju; Oh, Je Hoon
- 발행일
- 2010-12
- 유형
- Article; Proceedings Paper
- 권
- 205
- 호
- SUPPL. 1
- 페이지
- S158 ~ S163
- 언어
- ENG
- 출판사
- ELSEVIER SCIENCE SA
- 발행국가
- 스위스
- ISSN
- P 0257-8972