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Effect of Wafer-Brush Relative Velocity on Non-uniform PVA Brush Wear and Cleaning Consistency in Oxide Post-CMP Cleaning
- 제목
- Effect of Wafer-Brush Relative Velocity on Non-uniform PVA Brush Wear and Cleaning Consistency in Oxide Post-CMP Cleaning
- 저자
- 김태곤
- 발행일
- 2025-10-30
- 학회명
- International Conference on Planarization/CMP Technology
- 개최지
- Hong Kong