Demonstration of programmable light intensity of a micro-LED with a Hf-based ferroelectric ITZO TFT for Mura-free displays

  • Jin, Taewon; 
  • Kim, Sanghyeon; 
  • Han, Jae-Hoon; 
  • Ahn, Dae-Hwan; 
  • An, Seong Ui; 
  • ... Kim, Younghyun; 
  • 외 4명
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18

초록

We demonstrate the programmable light intensity of a micro-LED by compensating threshold voltage variability of thin-film transistors (TFTs) by introducing a non-volatile programmable ferroelectric material, HfZrO2 (HZO) into the gate stack of the TFT. We fabricated an amorphous ITZO TFT, ferroelectric TFTs (FeTFTs), and micro-LEDs and verified the feasibility of our proposed current-driving active matrix circuit. Importantly, we successfully present the programmed multi-level lighting of the micro-LED, utilizing partial polarization switching in the a-ITZO FeTFT. We expect that this approach will be highly promising for the next-generation display technology, replacing complicated threshold voltage compensation circuits with a simple a-ITZO FeTFT.

키워드

HF0.5ZR0.5O2 THIN-FILMS; THRESHOLD VOLTAGE; PIXEL CIRCUIT; GRAIN-SIZE; COMPENSATION; MEMORY; MOBILITY
제목
Demonstration of programmable light intensity of a micro-LED with a Hf-based ferroelectric ITZO TFT for Mura-free displays
저자
Jin, Taewon; Kim, Sanghyeon; Han, Jae-Hoon; Ahn, Dae-Hwan; An, Seong Ui; Noh, Tae Hyeon; Sun, Xinkai; Kim, Cheol Jun; Park, Juhyuk; Kim, Younghyun
DOI
10.1039/d2na00713d
발행일
2023-02
유형
Article
저널명
NANOSCALE ADVANCES
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5
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5
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