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Inherently Area-Selective Atomic Layer Deposition of Device-Quality Hf1-xZrxO2 Thin Films through Catalytic Local Activation
- 제목
- Inherently Area-Selective Atomic Layer Deposition of Device-Quality Hf1-xZrxO2 Thin Films through Catalytic Local Activation
- 저자
- 안지훈
- 발행일
- 2022-01-25
- 학회명
- 29회 반도체학술대회