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Robotics and Autonomous Systems
ISSN
P 0921-8890 E 1872-793X
출판사
Elsevier BV
국가
NETHERLANDS
발행 상태
활성
데이터베이스 수록 정보
CiteScore 2011-2025 (15년)
JCR 1998-2025 (28년)
SCIE 2010-2026 (17년)
Scopus 1988-2026 (39년)
SJR 1999-2020, 2022-2025 (26년)
전체 2건 중 1번부터 2번까지의 결과를 표시합니다.
2026
Article
Prediction of overlay deviation caused by reticle heating during EUV exposure
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- Ko, Hee-Chang ;
- Kim, Min-Woo ;
- Oh, Hye-Keun ;
- Son, Seung-Woo
- 2026-05
- Journal of Micro/Nanopatterning, Materials, and Metrology
- SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
Article
Image twist and placement error caused by heat absorption during EUV exposure
- Son, Seung-Woo ;
- Ko, Hee-Chang
- 2026-04
- Journal of Micro/Nanopatterning, Materials, and Metrology
- SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS