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International Electronic Journal of Elementary Education
ISSN
P 1307-9298
출판사
Dumlupinar Universty
국가
TURKEY
발행 상태
활성
데이터베이스 수록 정보
CiteScore 2011-2025 (15년)
DOAJ 2017-2025 (9년)
Scopus 2009-2026 (18년)
SJR 2010-2020, 2022-2025 (15년)
전체 111건 중 1번부터 10번까지의 결과를 표시합니다.
2026
Article
Recovering dielectric integrity in atomic layer etched ZrO2 MIM capacitors via post-etch annealing
- Lee, Jeongbin ;
- Oh, Jiwoo ;
- Kwon, Yongju ;
- Kim, Jung-Tae ;
- Kim, Ji Hwan ;
- ... Park, Tae Joo ;
- ... Ahn, Ji-Hoon ;
- ... Kim, Woo-Hee ;
- 외 1명
- 2026-10
- Applied Surface Science
- ELSEVIER
Article
Role of brush properties and pH on Cu ion-induced silica loading to polyvinyl acetal brushes during post-CMP cleaning
- Bisht, Sanjay ;
- Yadav, Maheepal ;
- Park, Se-Hoon ;
- Hiyama, Hirokuni ;
- Kim, Tae-Gon ;
- ... Park, Jin-Goo
- 2026-10
- Applied Surface Science
- ELSEVIER
Article
Molecular-level insight into amino acid additive effects on ceria-film interactions and STI-CMP selectivity
- Nguyen, Van-Tuan ;
- Yu, Nathaniel ;
- Kim, Patrick Joohyun ;
- Seo, Jihoon
- 2026-10
- Applied Surface Science
- ELSEVIER
Article
Thickness-dependent shift of the ferroelectric composition window in ultrathin Hf1-xZrxO2 thin films
- Kim, Gunho ;
- Kim, Hyo-Bae ;
- Cho, Hye-Won ;
- Lee, Hyungseok ;
- Kho, Wonwoo ;
- ... Ahn, Ji-Hoon ;
- 외 1명
- 2026-09
- Applied Surface Science
- ELSEVIER
Article
Interfacial anchoring via thin –OH functional enables hydration-resistant, enhanced thermal conductivity MgO composites
- Lee, Ye-Ji ;
- Park, Ji Young ;
- Cho, Hong-Baek ;
- Choa, Yong-Ho
- 2026-08
- Applied Surface Science
- ELSEVIER
Article
Catalyzed selective atomic layer deposition of SiO2 on amorphous carbon via silicon blocking by alkyltrichlorosilane self-assembled monolayers
- Lee, Seo-Hyun ;
- Yoon, Chang Mo ;
- Lee, Jeong-Min ;
- Kim, Woo-Hee
- 2026-08
- Applied Surface Science
- ELSEVIER
Article
Composition-controlled hafnium-based inorganic/organic hybrid dry photoresist via discrete feeding-molecular layer deposition
- Ha, Kyungryul ;
- Kim, Dong Geun ;
- Kim, Hyekyung ;
- Ahn, Ji-Hoon ;
- Kim, Woo-Hee ;
- ... Park, Tae Joo
- 2026-07
- Applied Surface Science
- ELSEVIER
Article
Atomic layer deposition of hafnium silicate thin films using a single source precursor
- Oh, Jieun ;
- Lee, Seo-Hyun ;
- Lee, Jeongbin ;
- Yoon, Chang Mo ;
- Kim, Daeyeong ;
- ... Kim, Woo-Hee ;
- 외 1명
- 2026-07
- Applied Surface Science
- ELSEVIER
Article
Atomic layer deposition of MoO2 using a tetravalent precursor for template-driven rutile TiO2 growth in DRAM capacitors
- Shin, Yoonchul ;
- Jeon, Yeon-Ji ;
- Kim, Ji Hwan ;
- Hong, Chan-Bin ;
- Yoon, Chang Mo ;
- ... Ahn, Ji-Hoon ;
- 외 2명
- 2026-05
- Applied Surface Science
- ELSEVIER
Article
Corrigendum to “Phase control of two-dimensional tin sulfide compounds deposited via atomic layer deposition.” (Applied Surface Science (2023) 612, (S0169433222034158), (10.1016/j.apsusc.2022.155887))
- Kim, Dong-geun ;
- Lee, Jimin ;
- Choi, Jeong-hun ;
- Ahn, Ji Hoon
- 2026-02
- Applied Surface Science
- ELSEVIER
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