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자료 필터
자료유형
발행연도
1993 ~ 2009
1993 2009
키워드
언어
전체 22건 중 1번부터 10번까지의 결과를 표시합니다.
2009
Article
Observation of Non-Gaussian and Generation-Recombination Noise in n-Type GaAs/AlGaAs Multiple Quantum Wells
- Kim, Youngsang ;
- Hong, Joo-Yoo ;
- Jeong, Heejun
- 2009-04
- Journal of the Korean Physical Society
- KOREAN PHYSICAL SOC
Article
Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography
- Cho, In Wook ;
- Park, Joon-Min ;
- Kim, Hyunsu ;
- Hong, Joo-Yoo ;
- Kim, Seong-Sue ;
- 외 2명
- 2009-04
- Proceedings of SPIE - The International Society for Optical Engineering
- SPIE
2008
Article
Anisotropic resist reflow process simulation for 22 nm elongated contact holes
- Park, Joon-Min ;
- Kim, Dai-Gyoung ;
- Hong, Joo-Yoo ;
- An, Ilsin ;
- Oh, Hye-Keun
- 2008-06
- Japanese Journal of Applied Physics
- JAPAN SOC APPLIED PHYSICS
Article
Critical dimension control for 32 nm node random contact hole array using resist reflow process
- Park, Joon-Min ;
- Kang, Young-Min ;
- Hong, Joo-Yoo ;
- Oh, Hye-Keun
- 2008-02
- Japanese Journal of Applied Physics
- JAPAN SOC APPLIED PHYSICS
2007
Article
Critical dimension control for 32 nm node random contact hole array with resist reflow process
- Park, Joon-Min ;
- Kang, Young-Min ;
- Park, Seung-Wook ;
- Hong, Joo-Yoo ;
- Oh, Hye-Keun
- 2007-11
- Proceedings of SPIE - The International Society for Optical Engineering
- SPIE
Article
Anisotropic resist reflow process simulation for 32 nm node elongated contact holes
- Park, Joon-Min ;
- Kim, Dai-Gyoung ;
- Hong, Joo-Yoo ;
- Oh, Hye-Keun
- 2007-11
- Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
- IEEE
Article
Photoresist adhesion effect of resist reflow process
- Park, Joon-Min ;
- Kim, Eun-Jin ;
- Hong, Joo-Yoo ;
- An, Ilsin ;
- Oh, Hye-Keun
- 2007-09
- Japanese Journal of Applied Physics
- JAPAN SOC APPLIED PHYSICS
2006