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박진구
Park, Jin Goo
ERICA 첨단융합대학
ERICA 신소재·반도체공학전공
연구분야
- (Bio-)MEMS,
- 반도체/전자재료 세정,
- 연마
자료 필터
자료유형
발행연도
1992 ~ 2027
1992 2027
키워드
언어
전체 949건 중 131번부터 140번까지의 결과를 표시합니다.
2020
Article
Characterization of Different Cobalt Surfaces and Interactions with Benzotriazole for CMP Application
- Ryu, Heon-Yul ;
- Lee, Chan-Hee ;
- Hwang, Jun-Kil ;
- Cho, Hwi-Won ;
- Prasad, Nagendra Yerriboina ;
- ... Kim, Tae-Gon ;
- ... Park, Jin-Goo ;
- 외 1명
- 2020-07
- ECS Journal of Solid State Science and Technology
- ELECTROCHEMICAL SOC INC
Article
The adsorption and removal of corrosion inhibitors during metal CMP
- Park, Jin-Goo ;
- Ryu, Heon Yul ;
- Kim, Tae Gon ;
- Yerriboina, Nagendra.Prasad ;
- Wada, Yutaka ;
- 외 2명
- 2020-06
- 2020 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2020 (CSTIC 2020)
- IEEE
Article
Nanocatalyst-induced hydroxyl radical ((OH)-O-center dot) slurry for tungsten CMP for next-generation semiconductor processing
- Poddar, Maneesh Kumar ;
- Ryu, Heon-Yul ;
- Yerriboina, Nagendra Prasad ;
- Jeong, Yeon-Ah ;
- Lee, Jung-Hwan ;
- ... Kim, Tae-Gon ;
- ... Park, Jin-Goo ;
- 외 6명
- 2020-03
- Journal of Materials Science
- SPRINGER
Article
Hybrid DHF and N-2 jet spray cleaning for silicon nitride and metal layer DRAM patterns
- An, Kook-Hyun ;
- Yerriboina, Nagendra Prasad ;
- Poddar, Maneesh Kumar ;
- Kim, Tae-Gon ;
- Lee, Dong-Kyu ;
- ... Park, Jin-Goo ;
- 외 3명
- 2020-02
- Microelectronic Engineering
- ELSEVIER
2019
Conference
Investigation of Corrosion Inhibitor Related Particle Contamination on Post Cu CMP Surface
- 2019-11-01
Conference
Quantitative comparison of silica and ceria abrasive contamination on PVA brush and its effect on post CMP cleaning process
- 2019-11-01
Conference
INVESTIGATION OF THE FORMATION OF WOX DURING W CHEMICAL MECHANICAL PLANARIZATION
- 2019-11-01