김태곤 프로필 사진

김태곤

KIM, TAE GON

ERICA 공학대학

ERICA 소재·부품융합전공

Web Of Science Scopus

연구분야

  • 계측, 
  • 반도체/전자재료 세정, 
  • 연마

자료 필터

자료유형

발행연도

2005 ~ 2027
2005 2027

키워드

언어

전체 104건 중 91번부터 100번까지의 결과를 표시합니다.

2008
Article

Removal of Organic Wax and Particles on Final Polished Wafer by Ozonated DI Water

  • 2008-06
  • 한국재료학회지
  • 한국재료학회
Article

Cu ECMP 공정에서 전해액이 연마거동에 미치는 영향

  • 2008-00
  • 한국재료학회지
  • 한국재료학회
2007
Article

Damage free particle removal from EUVL mask layers by high energy laser shock cleaning (LSC)

  • 2007-11
  • MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS
  • JAPAN SOCIETY APPLIED PHYSICS
Article

Effect of particle deposition and wet/dry cleaning methods on particle removal efficiency

  • 2007-10
  • ECS Transactions
  • Electrochemical Society, Inc.
Article

Surface preparation in CMP process; post CMP cleaning and defects

  • 2007-10
  • ECS Transactions
  • Electrochemical Society, Inc.
Article

Quantitative measurement of pattern collapse and particle removal force

  • 2007-10
  • ECS Transactions
  • Electrochemical Society, Inc.
Article

Development of post Ru CMP cleaning solutions

  • 2007-10
  • ICPT 2007 - International Conference on Planarization/CMP Technology, Proceedings
  • VDE Verlag GmbH
Article

Removal of organic wax and particles on silicon after batch type polishing by ozonated DI water

  • 2007-10
  • ECS Transactions
  • Electrochemical Society, Inc.