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자료 필터
자료유형
발행연도
2005 ~ 2027
2005 2027
키워드
언어
전체 104건 중 11번부터 20번까지의 결과를 표시합니다.
2025
Article
Effect of wafer-brush relative velocity on non-uniform PVA brush wear and cleaning consistency in oxide post-CMP cleaning
- 2025-10
- International Conference on Planarization/CMP Technology
- Chinese Mechanical Engineering Society (CMES)
Article
Effect of synthesis materials and process parameters on polyvinyl acetal (PVA) brushes properties and incoming impurities
- 2025-10
- International Conference on Planarization/CMP Technology
- Chinese Mechanical Engineering Society (CMES)
Article
Effect of Corrosion Inhibitors and Oxidizers to Achieve Controlled Molybdenum Oxidation and Dissolution
- 2025-10
- International Conference on Planarization/CMP Technology
- Chinese Mechanical Engineering Society (CMES)
Article
Stabilization of polyvinyl acetal (PVA) brushes via effective removal of intrinsic impurities through advanced cleaning techniques
- 2025-10
- International Conference on Planarization/CMP Technology
- Chinese Mechanical Engineering Society (CMES)
Conference
Slurry Effect of Azole-Free Inhibitors on Cu Dissolution in H2O2 and Non-H2O2 Based Wet Etching Solutions During Hard Mask Removal
- 2025-09-11
Article
Metal ion contamination and removal on oxide surfaces and polyvinyl acetal brushes during the tungsten post-CMP cleaning process
- Jalalzai, Palwasha ;
- Kumar, Sumit ;
- Meethal, Ranjith Punathil ;
- Han, Kwang-Min ;
- Klipp, Andreas ;
- ... Kim, Tae-Gon ;
- ... Park, Jin-Goo
- 2025-09
- SURFACES AND INTERFACES
- ELSEVIER
Article
Effect of the additives on controlling ceria-brush chemical bonding during post-CMP cleaning
- Sahir, Samrina ;
- Han, Kwang-Min ;
- Bisht, Sanjay ;
- Kim, Tae-Gon ;
- Park, Jin-Goo
- 2025-07
- Materials Science & Engineering B
- ELSEVIER
Article
Interaction study of copper ions and polyvinyl acetal (PVA) brush during copper post-CMP cleaning: Experimental and density functional theory study
- Bisht, Sanjay ;
- Yadav, Maheepal ;
- Kim, Byung Hyun ;
- Kim, Tae-Gon ;
- Park, Jin-Goo
- 2025-06
- Applied Surface Science
- ELSEVIER
Conference
Effect of Wet Cleaning Chemicals on Cross- Contamination During Post-CMP Cleaning
- 2025-05-22